KANAGAWA, Japan–Japan's Fab Solutions Inc. today (December 2, 2003) rolled out an electron-beam inspection and metrology system that promises to detect non-visual defects in ICs. The FS3000 EB-Scope ...

Applied Materials has introduced a new defect review system to help semiconductor manufacturers continue pushing the limits of chip scaling. The company’s SEMVision H20 system combines sensitive ...

Chipmakers are plotting out a strategy to scale the transistor to 10nm and beyond. Migrating to these nodes presents a number of challenges, but one issue is starting to gain more attention in the ...

MILPITAS, Calif., July 20, 2020 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced the revolutionary eSL10™ e-beam patterned-wafer defect inspection system. The new system is designed to ...

SANTA CLARA, Calif., Dec. 14, 2022 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today announced the commercial availability of “cold field emission” (CFE) technology, a breakthough in eBeam imaging ...

NAGOYA, Japan, September 01, 2025--(BUSINESS WIRE)--It was announced today that GaN (Gallium Nitride)-based e-Beam inspection and metrology for advanced semiconductor manufacturing, jointly developed ...

SAN JOSE — Moving to boost yields in advanced IC production, KLA-Tencor Inc. today (June 11) unveiled its latest electron-beam inspection tool for “electrical line monitoring” applications. The eS30 e ...

Dublin, Sept. 21, 2022 (GLOBE NEWSWIRE) -- The "E-Beam Wafer Inspection Systems - Global Market Trajectory & Analytics" report has been added to ResearchAndMarkets.com's offering. The global market ...

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MILPITAS, Calif., July 20, 2020 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced the revolutionary eSL10™ e-beam patterned-wafer defect inspection system. The new system is designed to ...

Applied’s new “cold field emission” technology works at room temperature, increasing nanoscale image resolution by up to 50% and imaging speed by up to 10X CFE eBeam technology enables leading ...