Venice, Florida — SoftJin, introduced NxDAT, a tool for the analysis of defects identified by mask inspection systems. The software includes features for defect navigation, visual display, defect ...
Extreme ultraviolet (EUV) lithography is finally in production at advanced nodes, but there are still several challenges with the technology, such as EUV mask defects. Defects are unwanted deviations ...
ALBANY, N.Y.--(BUSINESS WIRE)--SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for ...
Extreme ultraviolet (EUV) lithography is a promising next generation lithography technology that may succeed optical lithography at future technology nodes. EUV mask infrastructure and manufacturing ...
SoftJin, a provider of Customized Automation software for Electronic Design and Manufacturing, announces NxDAT, software for efficient Analysis of Defects identified by Mask Inspection Systems. The ...
The Mask Defect Inspection Equipment Market Research 2022-2030 Report Highlights Market Dynamics, Ultramodern Trends, Demand, And Forthcoming Developments That Affect The Overall Growth Of The ...
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