TOKYO--(BUSINESS WIRE)-- Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint lithography (NIL) template featuring a circuit line width of 10 nanometers (nm ...
The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...
A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. “For higher computing power of ...
The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...
A lithography strategy that combines ultra-large exposure field and fine-resolution imaging with algorithmic early zone ...
With over 8.9 million micromirrors, TI’s DLP991UUV digital micromirror device (DMD) enables maskless digital lithography for advanced packaging. Its 4096×2176 micromirror array, 5.4-µm pitch, and ...
Heidelberg, Germany – Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66 + direct-write lithography system, solidifying its position as the ultimate research tool ...
Integrated optical signal distributing, processing, and sensing networks require the miniaturization of basic optical elements, such as waveguides, splitters, gratings, and optical switches. To ...
Soft lithography is a family of non-photolithographic techniques used for fabricating micro- and nanostructures using elastomeric stamps, molds, and conformable photomasks. Unlike conventional ...
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